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Entity
proximity effect correction
technology2 mentionslast seen Sep 16, 2026
A technique used in electron beam lithography to improve fabrication fidelity of dense photonic crystal structures by compensating for nonuniform energy deposition during exposure.
Relationships 4
- proximity effect correctionapplies tophotonic crystal90% confidence1 source
- proximity effect correctionapplies tophotonic crystal cavity85% confidence1 source
- proximity effect correctionimplementselectron beam lithography85% confidence1 source
- Monte Carlo simulationapplies toproximity effect correction85% confidence1 source
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