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Entities25 of 207,987
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Entity
EUV lithography
market2 mentionslast seen Oct 16, 2026
Application domain for electromagnetic scattering simulation of photomasks.
Relationships 1
Relationship
physics-informed neural operatorapplies toEUV lithography
99% confidence2 supporting mentions
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Sources 2
- preprintarXivOct 13, 2026Global-in-time Spectral Duhamel-Picard Method for Post-Exposure Bake Simulation and Physics-Informed Neural Operators for EUV Lithography
Physics-Informed Neural Operators for EUV Lithography
- preprintarXivJul 28, 2026Physics-Informed Neural Operator for Warm-Starting Background-Decomposed and Preconditioned PSFD: Enabling Scalable 3-D EUV Mask Simulation
for electromagnetic (EM) scattering problems in EUV lithography